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FUN-LIGHT LEADERSHIP -- WINS SUPPORT HANDS DOWN

Author: rugbynickel41
Posted On: February 3, 2022, 6:31 am


Chemical type heater and etch method are important terms that must be found by
persons and businesses in the semiconductor industry. In the following
paragraphs, I am currently sharing the types of compound heaters utilised in the
humid process system as well as the silicon nitride etching process.

Types of chemical heat tank

Quartz - Gas Heater -- something that is designed to fulfill the growing with
regard to heated substantial purity fumes. It has the capacity of heat a wide
range of un wanted gas including: Freezing mixture (NH3), Helium (He), Argon
(ar) (Ar), Hydrogen (H2), Arsine (AsH3), Hydrogen Bromide (HBr), Boron
Trichloride (BCl3), Hydrogen Chloride (HCl), Carbon Dioxide (CO2), Nitrogen
(N2), Carbon Monoxide (CO), Chlorine (Cl2), Nitrous Oxide (N2O), Oxygen (O2),
Disilane (Si2H6), Sulfur Dioxide (SO2), Methylsilane (SiH3CH3)

Quartz - Liquefied Heater -- used in the semiconductor sector and its classic
application contains recirculation trap, either like the sole scalp source or
possibly a combination of your heated quartz tank.

SiC - HF & KOH Heater -- designed for home heating HF (hydrofluoric acide), KOH
(potassium hydroxide), and other high PH chemistries. It uses substantial purity
Silicon Carbide (SiC) as a heating transfer material because it provides
excellent temperature transfer houses and minimizes the risk of contaminants due
to Teflon breakdown.
Hydrobromic Acid about the Silicon Nitride Etch course of action

To be able to achieve the greatest etching rates and best selectivity, the
phosphoric acid should have the highest percentage of liquid at the temperature.
For as long as the boil stage is managed, the etch rate from both Si3N4 and SiO2
can be specifically controlled.

Having a cooking solution is amongst the challenges from the etch method. When
phosphoric acid can be heated, the solution begins boiling off. When heat is not
taken care of, it impacts the etching process given that acid concentration
increase. Moist etch companies use a typical temperature control to maintain
temp, but the normal water concentration will decrease and definately will
change the etch rates. Like a solution, wet etch approach engineers make use of
water addition system.

A technology called closed "reflux" system is made use of and it is designed
above the bathtub using distilling collar and a top - this is certainly to
minimize standard water addition.

The chemical fumes and great heat that Nitride Etch storage tanks are subjected
to are proven to decrease bath life drastically by assaulted the sealant that
helps prevent liquid and fumes from entering the heater space. This problem has
been addressed by making use of aquaseal.

Quartz Nitride Reflux system is manufactured to address the unique needs from
the silicon nitride etch procedure. It gives the following benefits to
customers: procedure uniformity, lot-to-lot repeatability, stops stratification.

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